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  • Release time: 2018 - 03 - 12
    Ultrathin AAO templates have self-organized honeycomb-like nanopores, and they are usually from several ten nanometers to several hundred nanometers in thickness.Ultrathin AAO templates have been widely used for fabrication of large-scale ordered arrays of surface nanostructures such as nanodots and nanoholes on the surface of substrates. Pores of ultrathin AAO template are uniform in diameter and highly ordered in a short-range. In addition, the material (Al2O3) is transparent in the near-infrared and visible spectrum, and is electrically insulated. Compared to other technology for making ord...
    Ultrathin AAO templates have self-organized honeycomb-like nanopores, and they are usually from several ten nanometers to several hundred nanometers in thickness.Ultrathin AAO templates have been widely used for fabrication of large-scale ordered arrays of surface nanostructures such as nanodots and nanoholes on the surface of substrates. Pores of ultrathin AAO template are uniform in diameter and highly ordered in a short-range. In addition, the material (Al2O3) is transparent in the near-infrared and visible spectrum, and is electrically insulated. Compared to other technology for making ord...
  • Release time: 2018 - 03 - 13
    A new type of AAO product (V-shape AAO) is developed by Topmembranes Technology. Compared to other anodic alumina membranes products, this profile of type of AAO is precisely tailored by the synergistic control of anodizing time, etching time and cyclic times, resulting in a unique structure for a wide range of applications.For more applications of V-shape AAO, please refer to: Adv. Mater. 2014, 26, 2805;ACS Nano, 2015, 9, 10287;Adv. Funct. Mater. 2017, 27, 1604720;Nanoscale Research Letters 2013, 8,268;J. Phys. Chem. C 2017, 121, 9757; Nano Energy, 2016, 22, 539; ACS Nano 2017, 11, 5113. ...
  • Release time: 2018 - 03 - 13
    AAO on Al substrate has honeycomb-like structure (shown in Fig. 1), composed with hexagon column of Al2O3, with a circular pore in the center. At the end of the pore, there is a half-sphere shape barrier layer oxide layer in contact with aluminum. The porous oxide film contains mutually parallel cylindrical pores extending from the barrier oxide layer to the film surface. AAO on Al substrate is the simplest product in AAO family, which can be fabricated into large area with a high success rate. Fig. 2 shows a typical picture of the AAO template.Fig. 1. Schematic of AAO on Al substrate.  F...
  • Release time: 2018 - 03 - 13
    Isotropic AAO templates, often referring to thicker AAO to be different from ultrathin AAO membrane, are widely used for a number of different fields. Topmembranes technology is specialized to make high quality isotropic AAO templates, with highly uniform and regular pore on both sides of the surfaces. The pores are arranged hexagonally within the single grains of the aluminum. The translucent nature of AAO is appealing to applications in biomedical field.Fig. 1. The structure diagram of isotropic AAO templates.Fig. 2. Typical SEM images of both sides of isotropic AAO template. Fig. 3. Ty...
  • Release time: 2018 - 03 - 13
    An sprayer, or airbrush, is an ideal tool for applying a thin layer of material on the substrate.We sell this for your convenience, the price of all set is less than $50. Depending on the amount of your purchase of other product, this airbrush can be free for your use.
Contact information

Telephone : +86 0755-2350 5289

Mail : service@topmembranes.com

Web : http://www.topmembranes.com

China · Shenzhen · Headquarters

Address : Tingwei Industrial Park, 6 Liufang Rd., Baoan District

Product Name

Micron level processing service

Date: 2018-12-27
Author: 10

Micron level processing service

At present, our company has completed the construction of clean rooms, and can provide various micron-scale machining services to provide customized products for the special needs of customers. Specifically include:


Lithography service: Ultraviolet exposure photoresist is used to develop and form the same or complementary structure as the mask. With a high precision lithography machine, the current reliable processing accuracy is less than 2 μm, area size varies from small area to standard 4 inches, the design and processing of lithography mask are providing as well.


In addition, our company sells a series of products of lithography machines, which can be adapted according to research funds and specific needs. For more details, please consult.

Micron level processing service

Lithography mask


Micron level processing service

Lithographic microstructure


Soft lithography: Based on photolithography and PDMS inversion process, according to the specific design of users, microfluidic chips or other devices are fabricated on the base (silicon wafer, glass) to achieve rapid prototyping verification. Unique access and exit integration interface technology, to achieve reliable access without leakage, save cumbersome access design, easy to use.

Micron level processing service

Microfluidic chip 


Microfluidic chips: Using precise CNC processing technology, microfluidic chips can be fabricated including standard chips, chemical reaction chips, analysis and detection chips, drop forming chips, cell analysis chips, concentration gradient chips, electrophoresis chips, etc.

Micron level processing service

Cross chip

Micron level processing service

Micron level processing service

S chip


Micron level processing service

T chip


Micron level processing service

Multi-Inlet Hybrid Chip

Micron level processing service

Concentration gradient chip


Micron level processing service

Cell analysis chip


Spin coating technology: an important step in the manufacture of MEMS. The quality of spin coating directly affects the effect of lithography and the quality of subsequent products. The company provides professional spin coating technology, sample covers 1 cm, 2 to 4 inch base, spin coating uniformity, high adhesion.


Laser Direct Writing: Masks used in traditional lithography processes need to be provided by specialized suppliers. In the R&D environment, the design of masks often needs to be changed. Laser direct writing technology overcomes this problem by designing electronic mask with software. Unlike the traditional process of illumination through physical masks, laser direct writing is a computer-controlled switch for a series of laser pulses, which directly exposes the desired pattern on the photoresist.


Electron beam evaporation: Electron beam evaporation is a kind of physical vapor deposition (PVD), which uses accelerated electron bombardment to coat materials. Different from the traditional evaporation method, electron beam evaporation can accurately bombard the crucible target with high energy electrons by using electromagnetic field, which can evaporate into gaseous state and deposit on the substrate. Electron beam evaporation can deposit high purity and high precision thin films. The greatest advantage of electron beam evaporation and resistance evaporation is that only heating the plating material produces relatively small heat, thus reducing the heating of the substrate material; accurate positioning of the electron beam can avoid evaporation and pollution of crucible material.


Nano-imprinting: Transfer the pattern to the substrate covered with the imprint under certain pressure through a prefabricated imprint template. The imprint is usually a thin polymer film, which is hardened by hot pressing or ultraviolet irradiation to retain the transferred pattern. The whole process includes three main processes: stamping, demoulding and etching. Nanoimprint technology breaks through the difficult problem of traditional lithography in the process of feature size reduction, and has the characteristics of high resolution, low cost and high yield.

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