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  • Release time: 2018 - 03 - 12
    Ultrathin AAO templates have self-organized honeycomb-like nanopores, and they are usually from several ten nanometers to several hundred nanometers in thickness.Ultrathin AAO templates have been widely used for fabrication of large-scale ordered arrays of surface nanostructures such as nanodots and nanoholes on the surface of substrates. Pores of ultrathin AAO template are uniform in diameter and highly ordered in a short-range. In addition, the material (Al2O3) is transparent in the near-infrared and visible spectrum, and is electrically insulated. Compared to other technology for making ord...
    Ultrathin AAO templates have self-organized honeycomb-like nanopores, and they are usually from several ten nanometers to several hundred nanometers in thickness.Ultrathin AAO templates have been widely used for fabrication of large-scale ordered arrays of surface nanostructures such as nanodots and nanoholes on the surface of substrates. Pores of ultrathin AAO template are uniform in diameter and highly ordered in a short-range. In addition, the material (Al2O3) is transparent in the near-infrared and visible spectrum, and is electrically insulated. Compared to other technology for making ord...
  • Release time: 2018 - 03 - 13
    A new type of AAO product (V-shape AAO) is developed by Topmembranes Technology. Compared to other anodic alumina membranes products, this profile of type of AAO is precisely tailored by the synergistic control of anodizing time, etching time and cyclic times, resulting in a unique structure for a wide range of applications.For more applications of V-shape AAO, please refer to: Adv. Mater. 2014, 26, 2805;ACS Nano, 2015, 9, 10287;Adv. Funct. Mater. 2017, 27, 1604720;Nanoscale Research Letters 2013, 8,268;J. Phys. Chem. C 2017, 121, 9757; Nano Energy, 2016, 22, 539; ACS Nano 2017, 11, 5113. ...
  • Release time: 2018 - 03 - 13
    AAO on Al substrate has honeycomb-like structure (shown in Fig. 1), composed with hexagon column of Al2O3, with a circular pore in the center. At the end of the pore, there is a half-sphere shape barrier layer oxide layer in contact with aluminum. The porous oxide film contains mutually parallel cylindrical pores extending from the barrier oxide layer to the film surface. AAO on Al substrate is the simplest product in AAO family, which can be fabricated into large area with a high success rate. Fig. 2 shows a typical picture of the AAO template.Fig. 1. Schematic of AAO on Al substrate.  F...
  • Release time: 2018 - 03 - 13
    Isotropic AAO templates, often referring to thicker AAO to be different from ultrathin AAO membrane, are widely used for a number of different fields. Topmembranes technology is specialized to make high quality isotropic AAO templates, with highly uniform and regular pore on both sides of the surfaces. The pores are arranged hexagonally within the single grains of the aluminum. The translucent nature of AAO is appealing to applications in biomedical field.Fig. 1. The structure diagram of isotropic AAO templates.Fig. 2. Typical SEM images of both sides of isotropic AAO template. Fig. 3. Ty...
  • Release time: 2018 - 03 - 13
    An sprayer, or airbrush, is an ideal tool for applying a thin layer of material on the substrate.We sell this for your convenience, the price of all set is less than $50. Depending on the amount of your purchase of other product, this airbrush can be free for your use.
Contact information

Telephone : +86 0755-2350 5289

Mail : service@topmembranes.com

Web : http://www.topmembranes.com

China · Shenzhen · Headquarters

Address : Tingwei Industrial Park, 6 Liufang Rd., Baoan District

Product Name

Micro-fabrication service

Date: 2018-12-27
Author: 26

Micron level processing service

At present, our company has completed the construction of our clean room, and can provide various micro-machining services and customize products for customers, including:


Photolithography: Ultraviolet photoresist is used to develop and form the same or complementary structures as those on the mask. With a high-precision photolithography machine, the current fabrication accuracy is less than 2 μm, the area size varies from small area to standard 4-inch, the design and ordering of lithography mask are provided as well.


In addition, we sell a series of photolithography machines, which can be configured according to your research funding and specific needs. For more details, please contact us.

Micron level processing service

Lithography mask


Micron level processing service

Lithographic microstructure


Soft lithography: Based on photolithography and PDMS inversion process, according to the specific design of users, microfluidic chips or other devices are fabricated on the base (silicon wafer, glass) to achieve rapid prototyping. Unique inlet/outlet integration technique enables easy and reliable input/output without leakage.

Micron level processing service

Microfluidic chip 


Microfluidic chips: Using precise CNC technology, microfluidic chips can be machined including standard chips, chemical reaction chips, analysis and detection chips, drop forming chips, cell analysis chips, concentration gradient chips, electrophoresis chips, etc.

Micron level processing service

Cross chip

Micron level processing service

Micron level processing service

S chip


Micron level processing service

T chip


Micron level processing service

Multi-Inlet Hybrid Chip

Micron level processing service

Concentration gradient chip


Micron level processing service

Cell analysis chip


Spin coating: an important step in the manufacture of MEMS. Spin coating plays a critical role in photolithography and the quality of final products. Our company provides professional spin coating with high uniformity and adhesion, covering sample size from 1 cm to 4-inch.


Direct Laser Writing: Masks used in photolithography are usually provided by special suppliers. In the R&D environment, the design of masks often needs to be customized. Direct laser writing technology overcomes this problem by designing structure pattern with software. Unlike exposure through a physical mask, direct laser writing directly write the designed patterns on the photoresist using compute-controlled laser pulses.


Electron beam evaporation: Electron beam evaporation is a kind of physical vapor deposition (PVD), which uses accelerated electron to bombard coating materials. Using electromagnetic field, high energy electron beam can be accurately focused on the target in the crucible, which can evaporate into gaseous state and deposit on the substrate. Electron beam evaporation can deposit  thin films with high purity and precision. Compared with thermal evaporation, the electron beam only heats a small part of target material and thus releases relatively less energy. Accurate aiming of the electron beam on the target can also avoid introducing pollution into the crucible.


Nano-imprinting: Transfer the pattern to the substrate covered with the resist under certain pressure through a prefabricated imprint template. Imprinting is usually on a thin polymer film, which is hardened by hot embossing or ultraviolet irradiation to retain the transferred pattern. The entire process includes three main steps: stamping, demoulding and etching. Nanoimprinting has solved the difficulties of traditional photolithography when the feature size further reduces to the nanometer range, and has advantages of high resolution, low cost and high yield.

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